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Karlos Calhoun
30115
Summerfield Loop. SE
Pittsburg, OK 30554
725-549-3542 (Work
Cell)
350-910-3612
(Personal Cell)
Karlos_calhoun11@gmail.com
Career Objective:
To use my experience in the semiconductor industry in a
process / equipment engineering position to support manufacturing or R&D areas. My semiconductor career focus has been on
plasma processing although I am open to work in other process areas and have
worked in these areas during integrated projects. My experience is primarily in silicon
processing, but has included some MEMs and GaAs projects.
Work Experience
04/06 - Present: Intel Corp.; Rio
Rancho, NM
- Currently working as a process / equipment
engineer in support of plasma etch and dry clean systems. Responsibilities include defect reduction /
control, cycle time and process improvements.
The primary focus is on the newest technology node for microprocessor
manufacturing. This work included an
assignment and transfer of key plasma technologies from the primary development
site.
07/04 - 04/06: Tokyo Electron Ltd; Austin , TX
- Worked as a
field process engineer to support dielectric etch systems at local customer
sites. This work included development
and testing of new hardware to eliminate backside polymers and throughput
enhancement process development.
1/02 - 06/04:
Austin Integrated School District; Austin , TX
- Achieved
certification and taught High School Physics/Chemistry and Biology for grades 9
and 10 at Austin High School . Classes included Honors and grade level
sections.
5/00 - 01/02:
Applied Materials; Austin ,
TX
- Program manager
for the International SEMATECH (ISMT) account.
Responsible for all AMAT equipment and projects at ISMT including
front-end, interconnect and yield management/metrology areas. This included development of new business and
projects with ISMT. Primary focus is on
meeting equipment and project needs for the ISMT 300 mm transition project.
7/93 - 5/00:
Novellus systems (Gasonics International); Austin, TX
-
Applications manager and engineer
responsible for central region process support for Gasonics plasma ash and
clean equipment. The management role
included supervision of process
engineers on all accounts and included direct process engineering support on
key accounts. The engineering work
included support of standard silicon processing and some MEMs and GaAs work as well with major customers. The
first 5 years were process engineering support of multiple accounts for various
applications. This work also included
direction of customer demos at the development lab located at CA
headquarters. Additional
responsibilities included corporate-wide process training.
12/90 - 7/93: SEMATECH (assignee from IBM Burlington , VT ); Austin , TX
- Worked as an
assignee engineer at SEMATECH. Projects
included: 1) Characterization of
process-induced damage and contamination effects for semiconductor
devices. This work included several
equipment and process evaluations including work that was used in development
of a new ICP etcher; 2) Final
development and technology transfer of ECR etch equipment and evaluation
project to member companies.
3/85 - 12/90: IBM Corp;
Burlington , VT
- Worked as a
plasma process engineer in support of CMOS DRAM and logic development and
manufacturing. This work involved
extensive collaboration with the East Fishkill ASTC and Yorktown Heights
research and development facilities.
Specific responsibilities included: 1)
Sustained manufacturing of 4 MB DRAM process in 8” production fab; 2) Development of 16 MB and 64 MB DRAM and logic
derivative production, including process design, DOEs and pilot processing
support. My focus was on plasma process
development and the integration of this with the full process flow; 3) Research and development activities including
RIE, MERIE, excimer laser dry processing as well as E-beam Proximity Mask
process development..
Intellectual Property:
Authored
over 20 semiconductor technology invention disclosures that have been granted
as patents or published in technical bulletins.
Representative Publications
Co-authored
over 20 technical publications related to semiconductor processing (list
available upon request).
Education
M.S.,
Chemical Engineering, Clarkson University ; Potsdam ,
N.Y. , May 1985; GPA=4.0/4.0, M.S.
Thesis: “The Kinetics of CF4/O2 Plasma
Etching of Polymers”
B.S.,
Chemical Engineering, Clarkson University ; Potsdam ,
N.Y. , May 1982;
GPA=
3.8/4.0. Graduated with Great
Distinction Honors.
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